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Fluoropolymer coating of medical grade poly(vinyl chloride) by plasma-enhanced chemical vapor deposition techniques

Publications associées (55)

RF bias to suppress post-oxidation of mu c-Si:H films deposited by inductively-coupled plasma using a planar RF resonant antenna

Ivo Furno, Alan Howling, Philippe Frédérique Bruno Guittienne, Rémy Jacquier

One challenge for microcrystalline silicon (mu c-Si:H) deposition is to achieve high deposition rates while maintaining high quality films. In this work, an inductively-coupled plasma (ICP) is used to deposit mu c-Si:H on glass substrates by means of a nov ...
2018

Correlation of surface chemical states with hydrogen isotope retention in divertor tiles of JET with ITER-Like Wall

Olivier Sauter, Ambrogio Fasoli, Basil Duval, Stefano Coda, Jonathan Graves, Yves Martin, Duccio Testa, Patrick Blanchard, Alessandro Pau, Cristian Sommariva, Henri Weisen, Richard Pitts, Yann Camenen, Jan Horacek, Javier García Hernández, Marco Wischmeier, Nicola Vianello, Mikhail Maslov, Federico Nespoli, Yao Zhou, David Pfefferlé, Davide Galassi, Antonio José Pereira de Figueiredo, Jonathan Marc Philippe Faustin, Liang Yao, Dalziel Joseph Wilson, Hamish William Patten, Samuel Lanthaler, Bernhard Sieglin, Otto Asunta

To understand the fuel retention mechanism correlation of surface chemical states and hydrogen isotope retention behavior determined by XPS (X-ray photoelectron spectroscopy) and TDS (Thermal desorption spectroscopy), respectively, for JET ITER-Like Wall s ...
ELSEVIER SCIENCE SA2018

Optimization of Sputter Deposition Process for Piezoelectric AlN Ultra-Thin Films

Kaitlin Marie Howell, Roman Welz

The sputtering conditions for the deposition of the layers underneath active AlN films were analyzed for improving the quality of the active AlN, and the dependence of AlN deposition temperature on crystalline quality was investigated, where a reduced depo ...
2017

Sputter Deposition Technology For Al((1-X))Sc(X)N Films With High Sc Concentration

Paul Muralt, Gabriel Christmann, Sylvain Nicolay, Stefan Mertin

Aluminium scandium nitride (Al1-xScxN) with its strongly enhanced piezoelectric response is the upcoming piezoelectric material of choice in next generation RF filters, sensors, actuators and energy harvesting devices. This paper will concentrate on the de ...
IEEE2017

Surface Reaction Kinetics of Titanium Isopropoxide and Water in Atomic Layer Deposition

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

In atomic layer deposition processes (ALD), surface reactions of adsorbed precursor species lead to the formation of thin films. In order to achieve a well-controlled, self-limiting process, the substrate is sequentially exposed to different precursor mole ...
American Chemical Society2016

Suspended micro resonator fabrication: atomic layer deposition

Annalisa De Pastina, Mathieu Basile Aberle

This project is focused on atomic layer deposition of aluminium oxide to fabricate suspended microchannel resonators. Few examples of the applications of such devices are blood analysis to detect cancerous cells or device cooling directly on the chip. The ...
2016

Status, Operation, and Extension of the ECRH System at ASDEX Upgrade

Timothy Goodman, Dávid Wágner, Stefan Müller, Hartmut Zohm

The upgraded electron cyclotron resonance heating (ECRH) system at ASDEX Upgrade (AUG) has been routinely used with eight gyrotrons during the last experimental campaign. A further upgrade will replace the existing system of four short-pulse (140 GHz, 2 s, ...
2016

The TORCH time-of-flight detector

Christoph Frei

The TORCH time-of-flight detector is being developed to provide particle identification between 2 and 10 GeV/c momentum over a flight distance of 10 m. TORCH is designed for large-area coverage, up to 30 m(2), and has a DIRC-like construction. The goal is ...
Elsevier Science Bv2016

Method and Apparatus for Coating Nanoparticulate Films on Complex Substrates

César Pulgarin, Juan Kiwi, Sami Rtimi

Active films and processes for depositing the same onto a complex 3D shape substrates and implants are provided. The process comprises the following steps: inserting into a process chamber a sputtering target, including at least two chemical elements and a ...
2016

Surface Kinetics of Titanium Isopropoxide in High Vacuum Chemical Vapor Deposition

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

Understanding the surface kinetics of precursor decomposition during thin film formation represents a key aspect in the understanding and engineering of chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. The determination of activ ...
American Chemical Society2015

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