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A Novel Low Noise Hydrogenated Amorphous Silicon Pixel Detector

Publications associées (35)

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Plasma-Assisted Hybrid Vapour Deposition Technology for Thin Film Fabrication

Caroline Hain

Continuous development of thin film deposition technologies is essential for the fabrication of films that meet the specific requirements of their target applications and working conditions. Therefore, it is necessary to increase the number of accessible a ...

EPFL2023

Vapor deposition of metal halide perovskite thin films: Process control strategies to shape layer properties

Christophe Ballif, Quentin Thomas Jeangros, Florent Sahli, Quentin Jean-Marie Armand Guesnay

Vapor-based processes are particularly promising to deposit the perovskite thin film absorber of solar cells. These deposition methods are up-scalable, involve a controlled solvent-free environment, have the ability to conformally coat rough substrates, in ...

2021

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Solar disinfection (SODIS) is a WHO-accepted intervention method for improving water sources in developing countries. Despite its effectiveness, the limitations of long exposure and bacterial regrowth risk demand further improvement of the practice. In thi ...

ELSEVIER SCIENCE SA2019

Roll-to-Roll Deposition of Semiconducting 2D Nanoflake Films of Transition Metal Dichalcogenides for Optoelectronic Applications

Kevin Sivula, Rebekah Anne Wells, Charles Roger Jean Lhermitte, Hannah Elizabeth Johnson

Exfoliated transition metal dichalcogenide (TMD) nanomaterials possess remarkable and tunable semiconducting properties which make them competitive for use in ultrathin, flexible devices such as photodetectors, sensors, and photoelectrodes for solar energy ...

2019

In the framework of the EMPIR project MetroBeta, the development and optimization of a double focalizing magnetic spectrometer have been realized in order to measure the beta spectra shape. The acquisition is designed to perform, after focalization by the ...

ELSEVIER2019

RF bias to suppress post-oxidation of mu c-Si:H films deposited by inductively-coupled plasma using a planar RF resonant antenna

Ivo Furno, Alan Howling, Philippe Frédérique Bruno Guittienne, Rémy Jacquier

One challenge for microcrystalline silicon (mu c-Si:H) deposition is to achieve high deposition rates while maintaining high quality films. In this work, an inductively-coupled plasma (ICP) is used to deposit mu c-Si:H on glass substrates by means of a nov ...

2018

The growth of single-layer MoS2 with chemical vapor deposition is an established method that can produce large-area and high quality samples. In this article, we investigate the geometrical and optical properties of hundreds of individual single-layer MoS2 ...

Mdpi Ag2017

X-ray-induced Cu deposition and patterning on insulators at room temperature

Giorgio Margaritondo, Ying Chen

X-ray irradiation is shown to trigger the deposition of Cu from solution, at room temperature, on a wide variety of insulating substrates: glass, passivated Si, TiN/Ti/SiO2/Si and photoresists like PMMA and SU-8. The process is suitable for patterning and ...

International Union of Crystallography2015

X-ray-induced Cu deposition and patterning on insulators at room temperature

Giorgio Margaritondo, Ying Chen

X-ray irradiation is shown to trigger the deposition of Cu from solution, at room temperature, on a wide variety of insulating substrates: glass, passivated Si, TiN/ Ti/SiO2/Si and photoresists like PMMA and SU-8. The process is suitable for patterning and ...

2015

Solid-on-liquid deposition (SOLID) techniques are of great interest to the MEMS and NEMS (Micro- and Nano Electro Mechanical Systems) community because of potential applications in biomedical engineering, on-chip liquid trapping, tunable micro-lenses, and ...

Elsevier2015