Publication

Nanoporous SiN membranes patterned by wafer-scale nanosphere lithography

Publications associées (72)

Data coding tools for color-coded vector nanolithography

Andrzej Kulik, Charles Baur, Sébastien Grange, Raphaël Foschia, Saveen Kumar

We propose and demonstrate the ability and efficiency of using a universal file format for a nanolithography pattern. A problem faced by the physicists working in the field of nanolithography is a lack of a flexible pattern design software (possibly open–s ...

2004

Enhancement of the nanostencil method and its applications

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Increased flexibility in patterning becomes important for the engineering of advanced nano/micro-electro-mechanical systems (NEMS/MEMS). Surfaces to be structured are either mechanically unstable and/or (bio-) chemically functionalized, such as ultra-thin ...

2004

Ties between Microsystems Technology and Nano-Engineering

Jürgen Brugger, Christian Santschi, Marc Antonius Friedrich van den Boogaart, Schahrazede-Lila Mouaziz, Johannes Steen, Nao Takano, Maïté Volatier

Our research is centered on the engineering of structures at the mesoscopic length scale. Patterns between the micrometer and nanometer bridge molecules and biological cells to microelectronics and microsystems, and further to the macroworld, and vice vers ...

2004

A microfluidic 2×2 optical switch

Demetri Psaltis

A 2×2 microfluidic-based optical switch is proposed and demonstrated. The switch is made of an optically clear silicon elastomer, Polydimethylsiloxane (PDMS), using soft lithography. It has insertion loss smaller than 1 dB and extinction ratio on the order ...

2004

Micro/nano Scale Patterning Method by Micro Contact Printing with Novel Type of PDMS Stamp

Jürgen Brugger, Joo Yeon Kim

not available ...

2004

Surface plasmon illumination scheme for contact lithography beyond the diffraction limit

Olivier Martin

A novel local illumination scheme for optical lithography is proposed. It is based on the excitation of a surface plasmon on a metal film incorporated into a polymer light coupling mask for contact lithography. The electromagnetic field associated with the ...

2003

Full wafer size micro/nanostencil with multiple length-scale apertures

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Sub-micron scale lithography methods using deep UV, X-ray or electron beams will allow for further progress in integrated circuit hardware manufacturing. The drawback of these high-end patterning methods however is firstly, the high cost of the equipment, ...

2002

Nanomechanical structure can be made without lithography

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

not available ...

2002

Contrast mechanisms in high-resolution contact lithography: A comparative study

Olivier Martin

We compare three different approaches to high-resolution contact lithography with special emphasis on contrast mechanisms for subwavelength structures. Masks with protruding metal absorbers, masks with absorbers embedded in the transparent background, and ...

Elsevier2001

Near-field distribution in light-coupling masks for contact lithography

Olivier Martin

We discuss the potential and limitations of Light-coupling masks for high-resolution subwavelength optical lithography. Using a three-dimensional fully vectorial numerical approach based on Green's tensor technique, the near-field distribution of the elect ...

1999

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