We present a much simpler and high-throughput method compared to mechanically break junctions (MBJ) and electro-migration, to produce a heterogeneous nanogap, directly using electron beam lithography and metal lift-off technology. Au – Pt and Au – Pt silicide electrodes pairs are fabricated using two-step electron beam lithography. The shape of the electrode apex and the distance between the electrodes are well controlled.
Olivier Martin, Christian Santschi, Banafsheh Abasahl
Luis Guillermo Villanueva Torrijo, Muhammad Faizan
Jürgen Brugger, Giovanni Boero, Xia Liu, Ana Conde Rubio, Mohammadreza Rostami