Publication
Nanostencils are used in dynamic mode to pattern on top of flexible substrates. As the stencil is moving during the material evaporation, the obtained structures are the convolution between the stencil trajectory and the apertures’ geometry. Variable-thickness and arbitrary shapes are obtained at 100 mm wafer scale.
Alain Nussbaumer, Heikki Tapani Remes, Abinab Niraula
Patricia Guaita, Raffael Baur, Enrique Corres Sojo, David Carlos Fernandez-Ordoñez Hernandez
Silvestro Micera, Simone Romeni