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Limitations of Proximity Lithography Printing

Publications associées (69)

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Improving Few-Shot Object Detection with Object Part Proposals

Devis Tuia, Marc Conrad Russwurm, Arthur Chevalley

Few-Shot Object Detection (FSOD) allows fast adaptation of an object detection model to new classes of objects using few examples per class. This has many applications, in particular in satellite and aerial observation, as it allows learning from experts w ...

The Institute of Electrical and Electronics Engineers, Inc2023

High resolution and three-dimensional printing in complex photosensitive materials

Christophe Moser, Antoine Vincent Boniface

The present invention is related to a method of volumetric manufacturing a three-dimensional object or article by illuminating a non-transparent and/or absorptive photo-sensitive material with light patterns from multiple angles, comprising the steps of ca ...

2022

Grayscale electron beam lithography (g-EBL) is a fabrication technique that allows for tunable control of resist topography. In most cases, the height of the structures is in the submicron regime. Here, we present an extensive experimental characterization ...

2020

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In proximity mask aligner photolithography, diffraction of light at the mask pattern is the predominant source for image shape distortions such as line end shortening and corner rounding. One established method to mitigate the impact of diffraction is opti ...

2019

High-resolution interference microscopy of binary phase diffractive optical elements

Toralf Scharf, Dong Cheon Kim, Michail Symeonidis

In this work, we apply the high-resolution interference microscopy technique to investigate the intensity and phase of light transmitted through a binary phase element. Using a combination of simulation and experimental results, we identify specific featur ...

OPTICAL SOC AMER2019

On Advanced Large-Field Photolithography

Raoul Kirner

The information age we live in today relies on highly integrated devices. They are fabricated with the help of photolithography, the patterning technique at the heart of their production. With the continuous demand for higher integration density to achieve ...

EPFL2019

Spatial coherence properties of an LED-based illumination system for mask-aligner lithography

Hans Peter Herzig, Toralf Scharf, Wilfried Noell, Raoul Kirner, Johana Bernasconi

A high-power LED-based illumination system has been developed as a replacement for the mercury arc lamps used in mask-aligner lithography. LEDs are arranged in a grid array and placed in the entrance aperture of individual reflectors. Those reflectors decr ...

SPIE2019

Optical-stack optimization for improved SPAD photon detection efficiency

Edoardo Charbon, Claudio Bruschini, Ivan Michel Antolovic, Ekin Kizilkan, Rolando Ferrini, Arin Can Ülkü, Scott Anthony Lindner, Marc Schnieper, Frédéric Zanella

Single-photon avalanche diodes (SPADs) are direct photon-to-digital detectors that enable scalable arrays with Poisson-limited signal-to-noise ratio and picosecond timing resolution. However, SPAD detectors require a guard-ring structure to prevent lateral ...

2019

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A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the Talbot effect for lithography has emerged a ...

2018

Mask-aligner Talbot lithography using a 193 nm CW light source

Toralf Scharf, Wilfried Noell, Raoul Kirner, Andreas Vetter

We present and discuss Talbot mask-aligner lithography, relying on a continuous wave laser emitting at 193nm for the illumination. In this source, a diode laser at 772nm is amplified by a tapered amplifier in master-oscillator power-amplifier configuration ...

2018