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We present a new strategy for the fabrication of long meander-like metallic patterns based on the use of nano-bridges to stabilize fragile SiN stencils. Continuous metal traces are obtained by taking advantage of a controllable blurring effect introduced by an appropriate gap between the stencil and the substrate. The SEM, AFM and electrical measurement results indicate that continuous, conductive metal traces are successfully produced. Our results are a case study on a SiN substrate that can be extended to other substrates, and thus represents an important enabling step towards high spatial resolution metal additive patterning on stretchable wearables.