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Piezoelectric and elastic properties of Al0.60Sc0.40N thin films deposited on patterned metal electrodes

Publications associées (33)

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Plasma-Assisted Hybrid Vapour Deposition Technology for Thin Film Fabrication

Caroline Hain

Continuous development of thin film deposition technologies is essential for the fabrication of films that meet the specific requirements of their target applications and working conditions. Therefore, it is necessary to increase the number of accessible a ...

EPFL2023

Characterization of thin film stress for MEMS planarization

The synthesis and stress characterization of metal thin-films deposited on silicon wafers were performed on this project. Two different deposition techniques were employed: magnetron sputtering and Atomic Layer Deposition (ALD). Moreover, different tests w ...

2022

Deposition of Thin Alumina Films Containing 3D Ordered Network of Nanopores on Porous Substrates

Martina Lihter

Self-supporting thin films containing nanopores are very promising materials for use for multiple applications, especially in nanofiltration. Here, we present a method for the production of nanomembranes containing a 3D ordered network of nanopores in an a ...

2020

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One challenge for microcrystalline silicon (mu c-Si:H) deposition is to achieve high deposition rates while maintaining high quality films. In this work, an inductively-coupled plasma (ICP) is used to deposit mu c-Si:H on glass substrates by means of a nov ...

2018

The sputtering conditions for the deposition of the layers underneath active AlN films were analyzed for improving the quality of the active AlN, and the dependence of AlN deposition temperature on crystalline quality was investigated, where a reduced depo ...

2017

Comparison of amorphous silicon absorber materials: Kinetics of light-induced degradation

Christophe Ballif, Franz-Josef Haug, Matthieu Despeisse, Mathieu Gérard Boccard, Michael Elias Stückelberger, Yannick Samuel Riesen, Adrian Billet

We investigate the influence of the deposition parameters for intrinsic amorphous silicon absorber layers on light-induced degradation (LID) of thin-film silicon solar cells. The focus is on absorber layers with different bandgaps: on one side, solar cells ...

Wiley-Blackwell2016

Explaining Morphological and Electrical Features of Boron-doped Zinc Oxide to Tailor New Electrodes for Photovoltaics

Lorenzo Fanni

TCOs are a class of metal oxides that combine transparency to visible light with electrical conductivity. Each TCO is characterized by the trade-off of these two properties which can be tuned for a particular application. This thesis is dedicated to the in ...

EPFL2016

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The boron-tailing effect in hydrogenated amorphous silicon (a-Si:H) solar cells describes the reduced charge collection specifically in the blue part of the spectrum for absorber layers deposited above a critical temperature. This effect limits the device ...

American Institute of Physics2015

We examine damage-free transparent-electrode deposition to fabricate high-efficiency amorphous silicon/crystalline silicon heterojunction solar cells. Such solar cells usually feature sputtered transparent electrodes, the deposition of which may damage the ...

Ieee-Inst Electrical Electronics Engineers Inc2014

Thin-film silicon solar cells are one possible answer to the increasing energy demand of today. Hydrogenated amorphous silicon (a-Si:H) plays a crucial role therein - as absorber layers, but also as doped layers to build p-i -n junctions. This thesis is de ...

EPFL2014