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Mechanisms of Pb(Zr0.53Ti0.47)O-3 thin film etching with ECR/RF reactor

Publications associées (52)

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The subject of light transmission through optically thin metal films perforated with arrays of subwavelength nanoholes has recently attracted significant attention. In this work, we present experimental and calculated results on optical transmission/reflec ...

SPIE-INT SOC OPTICAL ENGINEERING2011

In order that are usually created by top down techniques with subsequent processing steps. Adding such additional steps with nanometer placement accuracy challenges even the most powerful machines and increases the process time. To overcome such limitation ...

2011

Optical Properties of UT-Shaped Plasmonic Nanoaperture Antennas

Hatice Altug, Arif Engin Cetin, Serap Aksu

In this paper, we present numerical and experimental results on optical properties of a multi-resonant UT-shaped plasmonic nanoaperture antenna for enhanced optical transmission and near-field resolution. We propose different structure designs in order to ...

SPIE-INT SOC OPTICAL ENGINEERING2011

Influence of sample processing parameters on thermal boundary conductance value in an Al/AlN system

Christian Monachon, Ludger Weber, Mohamad Hojeij

The influence of sample processing parameters on the thermal boundary conductance (TBC) between aluminum and aluminum nitride has been investigated by transient thermoreflectance. An evaporated Al layer on the polished substrate yielded a TBC at ambient of ...

American Institute of Physics2011

Wafer-Scale Fabrication of Thin SiN Membranes and Au Films and Membranes with Arrays of Sub-um Holes Using Nanosphere Lithography

Mona Julia Katharina Klein

In this thesis, the wafer-scale fabrication of SiN membranes, Au films and Au membranes with arrays of sub-µm holes is described. Two conceptually different processes (1) and (2) were developed, both of which are based on nanosphere lithography (NSL) with ...

EPFL2010

Method for fabricating micromirror for barcode reader, involves forming holes having diameter less than width of arms on both side of micromirror and wafer and on edges of region separating wafer and micromirror by etching arms

Philippe Renaud, Faouzi Khechana, Nicolas Abelé

A method for fabricating a micromirror in a wafer, including the steps of: depositing and etching layers forming two arms; etching the wafer such that in the back face only a thin portion of the wafer remains in the region of formation of the micromirror a ...

2010

Physicochemical and Electrochemical Properties of Etched GaP(111)A and GaP(111)B Surfaces

Blake William Erickson

The observable chemical, electrochemical, and morphological features of GaP(111) surfaces after wet chemical etching have been assessed using X-ray photoelectron spectroscopy, atomic force microscopy, and electrochemical impedance spectroscopy. HF(aq), NH4 ...

2010

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This study investigates focused electron beam induced etching for the removal of alumina particles on patterned extreme ultra violet (EUV) mask using nitrosyl chloride (NOCl) as assist gas. As potential contaminant, particles of aluminum oxide (alumina, Al ...

2009

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The authors report on the achievement of a vertically oriented three pair airgap/GaN distributed Bragg reflector realized by controlled oxidation and wet-chemical etching of AlInN sacrificial layers. Microreflectivity measurements exhibit high peak reflect ...

2009

Fabrication of 150 nm half-pitch grating templates for nanoimprint lithography

Shenqi Xie, Yi-Chiang Sun

We present the fabrication of 150 nm half-pitch Si grating templates by reactive ion etch (RIE), which are used in nanoimprint lithography (NIL) for high groove density gratings in SU-8 plastic. The etch properties such as the etch rate, profile and etchin ...

2008