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Mechanisms of Pb(Zr0.53Ti0.47)O-3 thin film etching with ECR/RF reactor

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Mechanisms of Pb(Zr0.53Ti0.47)O-3 thin film etching with ECR/RF reactor

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Fluorine based plasma treatment of biocompatible silicone elastomer. Effect of temperature on etch rate and surface properties

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Beam-induced etching of material on substrate involves directing gaseous compound which reacts in the presence of beam to etch the excess material which not etching the substrate

Fluorine based plasma treatment of biocompatible silicone elastomer. Effect of temperature on etch rate and surface properties

Low-power hermetically sealed on-chip plasma light source micromachined in glass

Selective etching of AlInN/GaN heterostructures for MEMS technology

Low-power hermetically sealed on-chip plasma light source micromachined in glass

Patterning of parallel nanobridge structures by reverse nanostencil lithography using an edge-patterned stencil

Développement et étude d'une technique de microsablage à haute résolution

Pattern recovery by dry etching of gap-induced blurring in nanostencil lithography

Beam-induced etching of material on substrate involves directing gaseous compound which reacts in the presence of beam to etch the excess material which not etching the substrate

Deep reactive ion etching and focused ion beam combination for nanotip fabrication

Stenci Lithography: Status and Prospectives