Publication

Mechanisms of Pb(Zr0.53Ti0.47)O-3 thin film etching with ECR/RF reactor

Related publications (52)

About
Privacy
Disclaimer

Graph Chatbot

Chat with Graph Search

Ask any question about EPFL courses, lectures, exercises, research, news, etc. or try the example questions below.

DISCLAIMER: The Graph Chatbot is not programmed to provide explicit or categorical answers to your questions. Rather, it transforms your questions into API requests that are distributed across the various IT services officially administered by EPFL. Its purpose is solely to collect and recommend relevant references to content that you can explore to help you answer your questions.

Mechanisms of Pb(Zr0.53Ti0.47)O-3 thin film etching with ECR/RF reactor

Graph Chatbot

Chat with Graph Search

Fluorine based plasma treatment of biocompatible silicone elastomer. Effect of temperature on etch rate and surface properties

Low-power hermetically sealed on-chip plasma light source micromachined in glass

Low-power hermetically sealed on-chip plasma light source micromachined in glass

Patterning of parallel nanobridge structures by reverse nanostencil lithography using an edge-patterned stencil

Selective etching of AlInN/GaN heterostructures for MEMS technology

Développement et étude d'une technique de microsablage à haute résolution

Stenci Lithography: Status and Prospectives

Deep reactive ion etching and focused ion beam combination for nanotip fabrication

Pattern recovery by dry etching of gap-induced blurring in nanostencil lithography

Beam-induced etching of material on substrate involves directing gaseous compound which reacts in the presence of beam to etch the excess material which not etching the substrate

Low-power hermetically sealed on-chip plasma light source micromachined in glass

Selective etching of AlInN/GaN heterostructures for MEMS technology

Pattern recovery by dry etching of gap-induced blurring in nanostencil lithography

Fluorine based plasma treatment of biocompatible silicone elastomer. Effect of temperature on etch rate and surface properties

Stenci Lithography: Status and Prospectives

Low-power hermetically sealed on-chip plasma light source micromachined in glass

Patterning of parallel nanobridge structures by reverse nanostencil lithography using an edge-patterned stencil

Beam-induced etching of material on substrate involves directing gaseous compound which reacts in the presence of beam to etch the excess material which not etching the substrate

Développement et étude d'une technique de microsablage à haute résolution

Deep reactive ion etching and focused ion beam combination for nanotip fabrication