Lecture

Dry Etching Techniques

Description

This lecture covers various dry etching techniques for materials like silica, Pyrex, SiN4, and Si, including continuous and pulsed processes, cryogenic etching, and isotropic etching using SF6. It explains the use of different mask materials, gas compositions, pressures, and etch rates, as well as the importance of selectivity and surface quality in micro and nanofabrication.

About this result
This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.