Scanning Probe Lithography: Nanometer Scale Patterning Techniques

This lecture covers the principles and applications of Scanning Probe Lithography (SPL) for nanometer-scale patterning. Topics include variations of SPL techniques, exposure of resist by Atomic Force Microscopy (AFM), local field enhanced oxidation, Dip-Pen Nanolithography (DPN), and nanoscale dispensers. The instructor discusses the interaction nature and magnitude in SPL, SPL variations like mechanical and thermal, and the advantages of AFM exposure over Electron Beam Lithography (EBL). Additionally, the lecture explores the capabilities of DPN with different inks and the evolution from Dip Pen to Ink-reservoir systems. The use of local field enhanced oxidation for silicon oxidation and the fine resolution achieved are also highlighted.