Micro and Nanofabrication for Optomechanics

This lecture explores the importance of micro- and nanofabrication in the field of optomechanics, showcasing breakthroughs like ultra-high Q SiO₂ toroid resonators and SBS in silicon waveguides. It covers key fabrication processes such as lithography, layer deposition, etching, layer release, and bonding, emphasizing techniques like electron beam lithography and optical lithography. The lecture also delves into methods like spin-coating, CVD, evaporation, sputtering, wet and dry etching, lift-off processes, and planarization. Additionally, it discusses the challenges of layer release and bonding in optomechanical devices, highlighting the need for precise fabrication techniques and materials. Access to advanced fabrication technologies through cleanrooms or MPW-services is also addressed.