Concept

Extreme ultraviolet lithography

Related publications (318)

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This paper reports a novel miniaturized pseudo reference electrode (RE) design for biasing Ion Sensitive Field Effect Transistors (ISFETs). It eliminates the need for post-CMOS processing and can scale up in numbers with the CMOS scaling. The presented des ...

2021

FEM simulation: Thermal properties of thin film quartz and silicon resonators

This semester project aimed at simulating two approaches for low temperature dependence of resonance frequency of resonators. The first one consists in using AT-cut quartz as the resonator’s material. The AT-cut quartz wafers are made using a 35° angle wit ...

2021

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Ethynylbenziodoxol(on)e (EBX) cyclic hypervalent iodine reagents have become popular reagents for the alkynylation of radicals and nucleophiles, but only offer limited possibilities for further structure and reactivity fine-tuning. Herein, the synthesis of ...

2021

Diffractive optical elements in single crystal diamond

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We demonstrate the design, fabrication, and experimental characterization of near-field binary phase transmission diffractive optical elements (DOEs) in single crystal diamond. Top-hat and arbitrary pattern DOE beam shapers were numerically optimized using ...

OPTICAL SOC AMER2020

Tolerancing the surface form of aspheric microlenses manufactured by wafer-level optics techniques

Toralf Scharf, Wilfried Noell, Jeremy Béguelin

Tolerancing is an important step toward the fabrication of high-quality and cost-effective lens surfaces. It is critical for wafer-level optics, when up to tens of thousands microlenses are fabricated in parallel and whose surfaces cannot be formed individ ...

OPTICAL SOC AMER2020

Deep-UV-Enhanced Approach for Low-Temperature Solution Processing of IZO Transistors with High-k AlOx/YAlOx Dielectric

Danick Briand, Jaemin Kim, Alessio Mancinelli

Solution processing is an attractive alternative to standard vacuum fabrication techniques for the large-area manufacturing of metal oxide (MOx)-based electron devices. Here, we report on thin-film transistors (TFTs) based on a solution-processed indium zi ...

AMER CHEMICAL SOC2020

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Atomically thin materials, such as graphene and transition metal dichalcogenides, are promising candidates for future applications in micro/nanodevices and systems. For most applications, functional nanostructures have to be patterned by lithography. Devel ...

2020

Imaging plasma formation in isolated nanoparticles with ultrafast resonant scattering

Christoph Bostedt, Daniela Rupp, Alessandro Colombo

We have recorded the diffraction patterns from individual xenon clusters irradiated with intense extreme ultraviolet pulses to investigate the influence of light-induced electronic changes on the scattering response. The clusters were irradiated with short ...

2020

Grayscale e-beam lithography: Effects of a delayed development for well-controlled 3D patterning

Henning Paul-Julius Stahlberg

Grayscale electron beam lithography (g-EBL) is a fabrication technique that allows for tunable control of resist topography. In most cases, the height of the structures is in the submicron regime. Here, we present an extensive experimental characterization ...

2020

Template-assisted electrodeposition of nickel and nickel copper 3D microcomponents

Patrik Schürch

New types of metamaterials and architectured material require metallic materials with precise structural design in the microscale. However, additivemanufacturing of metallic structures in themicroscale has proven difficult, as the demand for the material q ...

EPFL2020

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