Publications related to Extreme ultraviolet lithography

Enabling proximity mask-aligner lithography with a 193nm CW light source

Toralf Scharf, Wilfried Noell, Raoul Kirner, Andreas Vetter

We introduce a novel industrial grade 193nm continuous-wave laser light source for proximity mask-aligner lithography. A diode seed laser in master-oscillator power-ampliﬁcation conﬁguraton is frequency-quadrupled using lithiumtriborate and potassium-ﬂuoro ...

2018

High-power modular LED-based illumination systems for mask-aligner lithography

Hans Peter Herzig, Toralf Scharf, Johana Bernasconi

Mask-aligner lithography is traditionally performed using mercury arc lamps with wavelengths ranging from 250 nm to 600 nm with intensity peaks at the i, g and h lines. Since mercury arc lamps present several disadvantages, it is of interest to replace the ...

2018

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Toralf Scharf, Wilfried Noell, Raoul Kirner, Andreas Vetter

A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the Talbot effect for lithography has emerged a ...

2018

Mask-aligner Talbot lithography using a 193 nm CW light source

Toralf Scharf, Wilfried Noell, Raoul Kirner, Andreas Vetter

We present and discuss Talbot mask-aligner lithography, relying on a continuous wave laser emitting at 193nm for the illumination. In this source, a diode laser at 772nm is amplified by a tapered amplifier in master-oscillator power-amplifier configuration ...

2018

Fast turnaround fabrication of silicon point-contact quantum-dot transistors using combined thermal scanning probe lithography and laser writing

Matthieu Jean Michel Rüegg, Cheng Wang, Nolan Lassaline

The fabrication of high-performance solid-state silicon quantum-devices requires high resolution patterning with minimal substrate damage. We have fabricated room temperature (RT) single-electron transistors (SETs) based on point-contact tunnel junctions u ...

2018

Three-Dimensional Shapes of Spinning Helium Nanodroplets

Marcel Drabbels, Andrew Daniel Bonnar Clark, Verónica Oliver Álvarez de Lara, Daniela Rupp

A significant fraction of superfluid helium nanodroplets produced in a free-jet expansion has been observed to gain high angular momentum resulting in large centrifugal deformation. We measured single-shot diffraction patterns of individual rotating helium ...

2018

High-Contrast Infrared Absorption Spectroscopy via Mass-Produced Coaxial Zero-Mode Resonators with Sub-10 nm Gaps

Hatice Altug, Aurélian Michel John-Herpin, Sunghwan Kim

We present a wafer-scale array of resonant coaxial nanoapertures as a practical platform for surface-enhanced infrared absorption spectroscopy (SEIRA). Coaxial nanoapertures with sub-10 nm gaps are fabricated via photolithography, atomic layer deposition o ...

2018

Semiconductor-based narrow-line and high-brilliance 193-nm laser system for industrial applications

Toralf Scharf, Wilfried Noell, Raoul Kirner, Andreas Vetter, Xiaolong Wang

We present a novel industrial-grade prototype version of a continuous-wave 193 nm laser system entirely based on solid state pump laser technology. Deep-ultraviolet emission is realized by frequency-quadrupling an amplified diode laser and up to 20 mW of o ...

2018

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Extreme ultraviolet lithography

Enabling proximity mask-aligner lithography with a 193nm CW light source

High-power modular LED-based illumination systems for mask-aligner lithography

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

High power ultraviolet LED illumination systems: coherence properties and applications in photolithography

Mask-aligner Talbot lithography using a 193 nm CW light source

Fast turnaround fabrication of silicon point-contact quantum-dot transistors using combined thermal scanning probe lithography and laser writing

Three-Dimensional Shapes of Spinning Helium Nanodroplets

High-Contrast Infrared Absorption Spectroscopy via Mass-Produced Coaxial Zero-Mode Resonators with Sub-10 nm Gaps

Semiconductor-based narrow-line and high-brilliance 193-nm laser system for industrial applications

Limitations of Proximity Lithography Printing

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Chat with Graph Search

Mask-aligner Talbot lithography using a 193 nm CW light source

High power ultraviolet LED illumination systems: coherence properties and applications in photolithography

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Fast turnaround fabrication of silicon point-contact quantum-dot transistors using combined thermal scanning probe lithography and laser writing

High-Contrast Infrared Absorption Spectroscopy via Mass-Produced Coaxial Zero-Mode Resonators with Sub-10 nm Gaps

Semiconductor-based narrow-line and high-brilliance 193-nm laser system for industrial applications

Limitations of Proximity Lithography Printing

Enabling proximity mask-aligner lithography with a 193nm CW light source

High-power modular LED-based illumination systems for mask-aligner lithography

Three-Dimensional Shapes of Spinning Helium Nanodroplets