Physical Vapor Deposition: Evaporation Techniques

This lecture covers the principles and equipment specifications of Physical Vapor Deposition (PVD) techniques, such as thermal evaporation. It explains the process of PVD, including shadowing effects, step coverage, and evaporation flux. Specific examples like LIFT-OFF and STENCIL Lithography are discussed, highlighting the importance of photoresist patterning and stencil alignment. The lecture also details the setup of an evaporation system, mentioning equipment like Leybold Optics LAB 600H and the materials that can be deposited. In summary, PVD is described as a simple, fast, and cost-effective method for producing high-purity films, although it has limitations in step coverage, uniformity, and compound evaporation.