Lecture

Fabrication: Implantation

Description

This lecture covers the process of ion implantation in silicon, essential for creating transistors and diodes. Topics include lithography, ion implantation steps, annealing, challenges, and solutions like rapid thermal annealing. It also discusses the implantation process, magnetic lenses, and the importance of temperature and time in annealing. After implantation, tricks for pattern location are shared, along with details on doping levels and the SmartCut® process for SOI wafers.

Instructor

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Official source

https://mediaspace.epfl.ch/media/0_4d8otc9c

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Ontological neighbourhood

Physics

Condensed matter physics: Solid-state physics

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