Lecture

Electron Beam Lithography: Interactions and Resist Contrast

In course

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Description

This lecture covers the electron-sample interactions in lithography, discussing the scattering of the electron beam into the resist and substrate, the effects of beam energy and substrate atomic mass, forward and backscattering phenomena, and resist exposure broadening. It also explores resist contrast, sensitivity, and dose distribution in positive and negative resists, emphasizing the importance of contrast for high-resolution lithography.

In MOOCs (3)

Instructors (2)

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Official source

https://mediaspace.epfl.ch/media/0_hbs88cyz

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