Explores microfabrication technologies, lithography, MEMS, cleanroom processes, resolution enhancement, phase shift masks, and chip manufacturing complexity.
Introduces ion beam etchers, combining physical sputtering with chemical activity.
Explores the wet etching process of glass and silicon using HF-based solutions and cleanroom processes for HF and BHF etchants.
Explores anisotropic etching of organic films and Al alloys, emphasizing the role of Al2O3 in Al etching and presenting examples of dry etching processes.
Explores the design of flexible neural interfaces and the challenges of integrating silicon-based devices onto flexible carriers.
Explores dry etching techniques in semiconductor processing, from barrel reactors to modern plasma sources like ICP and ECR.
