Electron Beam Lithography: II Electron Optics and Beam Deflection

In course

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Description

This lecture explains how electron beams are controlled and focused using electrostatic or electromagnetic lenses, detailing the differences with optical systems. It covers the design, alignment, and operation challenges, such as rotation effects, field stitching, and writing strategies.

In MOOCs (3)

Instructors (2)

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Official source

https://mediaspace.epfl.ch/media/0_klzao1vm

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