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Lecture
Deep Reactive Ion Etching: High Aspect Ratio Structures
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Micro and Nanofabrication for Optomechanics
Explores the importance of micro- and nanofabrication in optomechanics, covering key processes and challenges in device fabrication.
Micro and Nanofabrication: Chemical Reactions and Etching Processes
Explores chemical reactions and etching processes in micro and nanofabrication, including Si etching and the formation of porous Si.
Wet Etching: Crystal Structure and Anisotropy
Explores silicon crystal structure, anisotropy in etching rates, etch mechanisms, and different etching baths in micro and nanofabrication.
Dry Etching Techniques
Explores dry etching techniques in semiconductor processing, from barrel reactors to modern plasma sources like ICP and ECR.
Dry etching: fundamentals and applications
Explores the fundamentals of dry etching in a gas plasma and provides simple rules for choosing dry etchants.
Wet Etching: Glass and Silicon
Explores the wet etching process of glass and silicon using HF-based solutions and cleanroom processes for HF and BHF etchants.
Nanoscale MEMS: Fabrication, Tips, and Microscopy
Covers the fabrication of nanoscale MEMS devices and the operation of the Atomic Force Microscope for measuring ultrasmall forces on particles.
Plasma Physics: Sheaths and Etching
Explores plasma formation, sheath creation, and plasma etching applications for integrated circuit manufacturing.
Ion Beam Etching
Introduces ion beam etchers, combining physical sputtering with chemical activity.
Industrial Plasmas: Sheath Formation and Plasma Etching
Explores sheath formation, plasma etching, ion velocity, and energy in industrial plasmas, emphasizing their significance for modern electronics manufacturing.