Plasma Physics: Sheaths and Etching

This lecture covers the formation of plasma from Townsend discharge to glow and arcs, explaining the transition from non-self-sustaining to self-sustaining discharges. It delves into the creation of sheaths, discussing the ion and electron thermal fluxes, plasma-wall interactions, and the equilibrium of ion and electron fluxes to the wall. The lecture also explores the applications of plasma etching, highlighting the importance of directional ion flux for anisotropic etching crucial in modern integrated circuit manufacturing.