Lithography: Mask and Laser Writing

In course

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Description

This lecture covers the process flow of photomask creation, the difference between serial and parallel exposure in photolithography, the direct laser writing technique, resolution considerations, and the development and etching steps. It also discusses the CAD file conversion to the mask, shape corrections, and examples of direct writing of SU-8 negative-tone resist for MEMS applications.

In MOOCs (3)

Instructors (2)

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Official source

https://mediaspace.epfl.ch/media/0_yrvkizn8

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