Publications by Katrin Sidler Arnet

High-resolution 1D moirés as counterfeit security features

Jürgen Brugger, Roger Hersch, Katrin Sidler Arnet, Victor Javier Cadarso Busto, Sylvain Chosson

A moire is an interference pattern that appears when two different periodic structures are overlaid. The image created is extremely sensitive to small variations in the original layers and is thus very interesting for anti-counterfeit protection. We presen ...

Nature Publishing Group2013

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Cristina Martin Olmos, Katrin Sidler Arnet

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fa ...

MDPI2013

Streched organic transistors maintain mobility on flexible substrates

Jürgen Brugger, Mihai Adrian Ionescu, Andreea Veronica Savu, Dimitrios Tsamados, Katrin Sidler Arnet, Nenad Cvetkovic

Two levels of aligned stencil lithography were used to fabricate pentacene thin film transistors on 12 mu m thick flexible polyimide substrates. Flexible transistors with 20 x 40 mu m(2) channels were electrically measured under strain up to 2.6%. After on ...

Elsevier2012

Compliant membranes improve resolution in full-wafer micro/nanostencil lithography

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Katrin Sidler Arnet

This work reports on a considerable resolution improvement of micro/nanostencil lithography when applied on full-wafer scale by using compliant membranes to reduce gap-induced pattern blurring. Silicon nitride (SiN) membranes are mechanically decoupled fro ...

2012

Organic half-wave rectifier fabricated by stencil lithography on flexible substrate

Jürgen Brugger, Mihai Adrian Ionescu, Andreea Veronica Savu, Dimitrios Tsamados, Katrin Sidler Arnet, Nenad Cvetkovic

Elsevier2012

All-stencil transistor fabrication on 3D silicon substrates

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Cyrille Hibert, Philippe Langlet, Cristina Martin Olmos, Oscar Vazquez Mena, Katrin Sidler Arnet, Peter Vettiger

The standard lithographic techniques to fabricate electronic components involve the use of polymers, baking steps and chemicals. This typically restricts their application to flat substrates made up of standard materials. Stencil lithography has been propo ...

Iop Publishing Ltd2012

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie, Oscar Vazquez Mena, Katrin Sidler Arnet, Wei Tang

Stencil lithography (SL) is a shadow mask technique which allows parallel, resistless, micro- and nano- patterning of material through apertures created in a membrane (stencil) onto a substrate. The stencils are usually made of LPCVD low-stress SiN due to ...

Elsevier2011

The effects of channel length and film microstructure on the performance of pentacene transistors

Jürgen Brugger, Andreea Veronica Savu, Libero Zuppiroli, Katrin Sidler Arnet, Franziska Dora Fleischli

With the use of the stencil lithography, we fabricated pentacene thin-ﬁlm transistors pre- pared directly on thermally oxidized silicon gates with channel lengths ranging from 2 to 600 lm. By performing 4-probe measurements or by using the transfer line me ...

Elsevier2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie, Oscar Vazquez Mena, Katrin Sidler Arnet, Wei Tang

Stencil lithography (SL) is a shadow mask based technique which allows parallel, resistless, micro- and nano-patterning of material through apertures in a membrane (stencil) onto a substrate [1]. The stencils are usually made of LPCVD low-stress SiN due to ...

Microelectronic Engineering2011

Reliable and Improved Nanoscale Stencil Lithography by Membrane Stabilization, Blurring and Clogging Corrections

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Oscar Vazquez Mena, Katrin Sidler Arnet

The reliable and reproducible fabrication of nanostructures by stencil lithography faces three main challenges: the stability of the thin stencil membranes with nanoapertures, the blurring of the deposited structures, and the clogging of the nanoapertures ...

2011