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Physicochemical and Electrochemical Properties of Etched GaP(111)A and GaP(111)B Surfaces

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Physicochemical and Electrochemical Properties of Etched GaP(111)A and GaP(111)B Surfaces

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Fabrication and characterization of metal nanolevers made by shadow mask technology

90 MHz nanomechanical structures fabricated by stencil deposition and dry etching

90 MHz nanomechanical structures fabricated by stencil deposition and dry etching

Low numerical aperture refractive microlenses in fused silica

DEEP ANISOTROPIC ETCHING OF SILICON USING LOW PRESSURE HIGH DENSITY PLASMA. PRESENTATION OF COMPLEMENTARY TECHNIQUES AND THEIR APPLICATIONS IN MICROTECHNOLOGY.

Soft and rigid two-level microfluidic networks for patterning surfaces

Etching of RuO2 and Pt thin films with ECR/RF reactor

Mechanisms of Pb(Zr0.53Ti0.47)O-3 thin film etching with ECR/RF reactor

Etching of platinum thin films with dual frequency ECR/RF reactor

Low frequency noise in dry and wet etched InAlAs/InGaAs HEMTs

Fabrication and characterization of metal nanolevers made by shadow mask technology

Low numerical aperture refractive microlenses in fused silica

DEEP ANISOTROPIC ETCHING OF SILICON USING LOW PRESSURE HIGH DENSITY PLASMA. PRESENTATION OF COMPLEMENTARY TECHNIQUES AND THEIR APPLICATIONS IN MICROTECHNOLOGY.

Etching of RuO2 and Pt thin films with ECR/RF reactor

90 MHz nanomechanical structures fabricated by stencil deposition and dry etching

Soft and rigid two-level microfluidic networks for patterning surfaces

Low frequency noise in dry and wet etched InAlAs/InGaAs HEMTs

90 MHz nanomechanical structures fabricated by stencil deposition and dry etching

Etching of platinum thin films with dual frequency ECR/RF reactor

Mechanisms of Pb(Zr0.53Ti0.47)O-3 thin film etching with ECR/RF reactor