Thermal conductivity contrast measurement of fused silica exposed to low-energy femtosecond laser pulses
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Low energy femtosecond laser pulses locally increase the refractive index and the hydro-fluoric acid etching rate of fused silica. These phenomena form the basis of a direct-write method to fabricate integrated glass devices that are of particular interest ...
Femtosecond laser pulses used in a regime below the ablation threshold have two noticeable effects on Fused Silica (a-SiO2): they locally increase the material refractive index and modify its HF etching selectivity. The nature of the structural changes ind ...
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Institute of Electrical and Electronics Engineers1992
