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High-power modular LED-based illumination systems for mask-aligner lithography

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Enabling proximity mask-aligner lithography with a 193nm CW light source

Toralf Scharf, Wilfried Noell, Raoul Kirner, Andreas Vetter

We introduce a novel industrial grade 193nm continuous-wave laser light source for proximity mask-aligner lithography. A diode seed laser in master-oscillator power-ampliﬁcation conﬁguraton is frequency-quadrupled using lithiumtriborate and potassium-ﬂuoro ...

2018

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Printing industry and printing techniques are increasing its market value by new methodologies. The resolution and accuracy of the pattern transfer is always a challenge for the industry, especially for the proximity printing industries which use mask alig ...

Elsevier2017

Limitations of Proximity Lithography Printing

Krishnaparvathy Puthankovilakam

Photolithography is one of the earliest technologies used to transfer patterns to a substrate. It is also known as optical lithography since it uses light to transfer the pattern. The main exposure techniques exist in the industry are projection printing, ...

EPFL2017

Panel: Looking Backwards and Forwards

Giovanni De Micheli

Ten years ago, at 90 nanometers, EDA was challenged and deemed inadequate in dealing with increasing complexity, power consumption, and sub-wavelength lithography, thus harming the progress of mobile phones. Today, at 10 nanometers, integration capacity ha ...

IEEE2016

Determinants of disinfectant pretreatment efficacy for nitrosamine control in chloraminated drinking water

Urs von Gunten

Utilities using chloramines need strategies to mitigate nitrosamine formation to meet potential future nitrosamine regulations. The ability to reduce NDMA formation under typical post-chloramination conditions of pretreatment with ultraviolet light from a ...

Elsevier2015

Light wavelength-dependent E. coli survival changes after simulated solar disinfection of secondary effluent

César Pulgarin, Sami Rtimi, Stefanos Giannakis

In this study, the photoreactivation and the modification of dark repair of E. coli in a simulated secondary effluent were investigated after initial irradiation under different conditions. The simulated solar exposure of the secondary wastewater was follo ...

Royal Society of Chemistry2015

Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization

Hans Peter Herzig, Toralf Scharf, Qing Tan, David Nguyen, Krishnaparvathy Puthankovilakam

Proximity exposure techniques in lithography are getting more and more popular because of the cost of ownership advantage of mask aligners compared to projection systems. In this paper a gap between simulation and the final result, the prints will be close ...

Spie-Int Soc Optical Engineering2014

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We have experimentally studied the variation in electrical resistance of flexible platinum lines patterned on polyimide foil when they are subjected to circular bending constraints. The lines were patterned by means of standard photolithography and sputter ...

Elsevier2014

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Recent improvements in light-emitting diode (LED) technology has allowed for the use of LEDs for solar simulators with excellent characteristics. In this paper, we present a solar simulator prototype fully based on LEDs. Our prototype has been designed spe ...

Ieee-Inst Electrical Electronics Engineers Inc2014

A High-Efficiency Nonuniform Grating Coupler Realized With 248-nm Optical Lithography

Christophe Marcel Georges Galland, Yang Liu

We describe a high-efficiency grating coupler (GC) fabricated on a silicon-on-insulator wafer with 220 nm top silicon layer. One single 60 nm shallow etch is required to define the diffractive gratings with a minimum lithographic feature size of 180 nm, wh ...

Institute of Electrical and Electronics Engineers2013