Publication

Ultrahigh flux gas-selective nanoporous carbon membrane and manufacturing method thereof

Kumar Varoon Agrawal, Nikunj Dudani, Mostapha Dakhchoune, Shiqi Huang, Guangwei He
2018
Patent

Abstract

The present relates to a nanoporous carbon membrane manufacturing method comprising coating a block copolymer film with hydrophilic and hydrophobic blocks, on a sacrificial non-porous substrate so as to prepare an block copolymer film coated foil, transferring the block copolymer film on a porous support, pyrolizing the block copolymer film to form a nanoporous carbon film, wherein the transfer step consists in a wet-transfer process comprising placing the block copolymer film coated foil in an etchant bath in an etching chamber and the porous support above the height of said etching bath, etching the underlying sacrificial foil of block copolymer film coated foil, raising the height of the etching bath above the porous support, bringing the free-floating etched block copolymer film on top of the porous support, and lowering the etching bath height below the porous support so as to deposit the copolymer film on top of the porous support.

Official source

https://infoscience.epfl.ch/record/273101?ln=en

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Ontological neighbourhood

Electrical engineering

Electromechanics: Microelectromechanical systems

Related concepts (18)

Etching (microfabrication)

Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which resists etching. In some cases, the masking material is a photoresist which has been patterned using photolithography. Other situations require a more durable mask, such as silicon nitride.

Copolymer

In polymer chemistry, a copolymer is a polymer derived from more than one species of monomer. The polymerization of monomers into copolymers is called copolymerization. Copolymers obtained from the copolymerization of two monomer species are sometimes called bipolymers. Those obtained from three and four monomers are called terpolymers and quaterpolymers, respectively. Copolymers can be characterized by a variety of techniques such as NMR spectroscopy and size-exclusion chromatography to determine the molecular size, weight, properties, and composition of the material.

Reactive-ion etching

Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it. A typical (parallel plate) RIE system consists of a cylindrical vacuum chamber, with a wafer platter situated in the bottom portion of the chamber.

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