Etching (microfabrication)Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which resists etching. In some cases, the masking material is a photoresist which has been patterned using photolithography. Other situations require a more durable mask, such as silicon nitride.
ErosionErosion is the action of surface processes (such as water flow or wind) that removes soil, rock, or dissolved material from one location on the Earth's crust and then transports it to another location where it is deposited. Erosion is distinct from weathering which involves no movement. Removal of rock or soil as clastic sediment is referred to as physical or mechanical erosion; this contrasts with chemical erosion, where soil or rock material is removed from an area by dissolution.
Reactive-ion etchingReactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it. A typical (parallel plate) RIE system consists of a cylindrical vacuum chamber, with a wafer platter situated in the bottom portion of the chamber.
Coastal erosionCoastal erosion is the loss or displacement of land, or the long-term removal of sediment and rocks along the coastline due to the action of waves, currents, tides, wind-driven water, waterborne ice, or other impacts of storms. The landward retreat of the shoreline can be measured and described over a temporal scale of tides, seasons, and other short-term cyclic processes. Coastal erosion may be caused by hydraulic action, abrasion, impact and corrosion by wind and water, and other forces, natural or unnatural.
Soil erosionSoil erosion is the denudation or wearing away of the upper layer of soil. It is a form of soil degradation. This natural process is caused by the dynamic activity of erosive agents, that is, water, ice (glaciers), snow, air (wind), plants, and animals (including humans). In accordance with these agents, erosion is sometimes divided into water erosion, glacial erosion, snow erosion, wind (aeolean) erosion, zoogenic erosion and anthropogenic erosion such as tillage erosion.
Cycle of erosionThe geographic cycle, or cycle of erosion, is an idealized model that explains the development of relief in landscapes. The model starts with the erosion that follows uplift of land above a base level and ends, if conditions allow, in the formation of a peneplain. Landscapes that show evidence of more than one cycle of erosion are termed "polycyclical". The cycle of erosion and some of its associated concepts have, despite their popularity, been a subject of much criticism.
Sodium channelSodium channels are integral membrane proteins that form ion channels, conducting sodium ions (Na+) through a cell's membrane. They belong to the superfamily of cation channels. They are classified into 2 types: In excitable cells such as neurons, myocytes, and certain types of glia, sodium channels are responsible for the rising phase of action potentials. These channels go through three different states called resting, active and inactive states.
PhotolithographyIn integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protect selected areas of it during subsequent etching, deposition, or implantation operations. Typically, ultraviolet light is used to transfer a geometric design from an optical mask to a light-sensitive chemical (photoresist) coated on the substrate.
PhotoresistA photoresist (also known simply as a resist) is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronics industry. The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface.
Erosion and tectonicsThe interaction between erosion and tectonics has been a topic of debate since the early 1990s. While the tectonic effects on surface processes such as erosion have long been recognized (for example, river formation as a result of tectonic uplift), the opposite (erosional effects on tectonic activity) has only recently been addressed. The primary questions surrounding this topic are what types of interactions exist between erosion and tectonics and what are the implications of these interactions.
