Preparation of La1-xSrxCoO3 electrodes for ferroelectric thin films by RF magnetron sputtering
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Intermetallic thin films of stoichiometric NiAl and Ni3Al have been deposited onto n-type silicon (100) and nickel (110) substrates using r.f.-magnetron co-sputtering. The morphology and crystal structure of the thin films have been studied by transmission ...
When silicon thin films are deposited by plasma enhanced chemical vapor deposition in a plasma regime close to the formation of powder, a new type of material, called hydrogenated polymorphous silicon (pm-Si:H) is obtained. This material has increased tran ...
Electrodeposition on Highly Oriented Pyrolytic Graphite (HOPG) steps has been proven to be an easy method for the preparation of metal (Pd, Cu, Ag etc) and metal oxide or sulfide (MoO2, MnO2, MoS2) nanowires in recent years. These wires can be transferred ...
Titanium dioxide is a cheap, chemically stable and non-toxic material. However its electrical properties are unstable and it is a modest semiconductor and a mediocre insulator. For several applications it would be interesting to make it either more insulat ...
Titanium dioxide (TiO2) is a widely investigated material for its biological compatibility, high dielectric constant and refractive index, chemical and mechanical resistance, and catalytic activity. Several different techniques are available to produce TiO ...
PZT thin films for memory applications are known to lack sufficient resistance versus polarization fatigue when used together with platinum. One possible solution for this problem is to use conductive oxides like La1-xSrxCoO3 (LSCO) as an electrode. In thi ...
Zinc oxide (ZnO) is a material that belongs to the family of Transparent Conductives Oxides (TCO). Its non-toxicity and the abundant availability in the Earth's crust of its components make it an ideal candidate as electrical transparent contact for thin-f ...
Strontium barium niobate thin films have been deposited by pulsed laser deposition on (111)-textured Pt films, p-doped Si(I 00) and Nb doped STO (SrTiO3) single crystals. The deposition parameters were optimized for obtaining phase pure (001)-oriented film ...
Conformal epitaxy is an epitaxial growth technique capable of yielding low dislocation density III-V films on Silicon. In this technique, the growth of the m-V material occurs parallel to the silicon substrate, from the edge of a previously deposited III-V ...
Single crystals of layered semiconductors such as WS2 and MoS2 have already proven their efficiency as active elements in photovoltaic cells. Due to their high optical absorption coefficient in the visible range, these materials could be used in the form o ...