Michail Zervas, Yusuf Leblebici, Mustafa Yilmaz, Özgür Özsun, Izzet Yildiz
Si nanowire (NW) stacks are fabricated by utilizing the scalloping effect of inductively coupled plasma deep reactive ion etching. When two etch windows are brought close enough, scallops from both sides will ideally meet along the dividing centerline of t ...
Institute of Electrical and Electronics Engineers2009