Publications associées à Lithographie extrême ultraviolet

Collisional damping rates for electron plasma waves reassessed

Collisional damping of electron plasma waves, the primary damping for high phase velocity waves, is proportional to the electron-ion collision rate, nu(ei,th). Here, it is shown that the damping rate normalized to nu(ei,th) depends on the charge state, Z, ...

Amer Physical Soc2017

Silk Fibroin as a Resist for Thermal Scanning Probe Lithography

Jürgen Brugger, Xiao Sheng Zhang, Ya Wang, Samuel Zimmermann

We present for the first time nano-scale patterning of silk fibroin with a thermal scanning probe to locally convert water-insoluble crystalline silk into the water-soluble phase. Our first experiments demonstrate silk as a fully water-based resist for the ...

2017

Non-linear simulations of the TCV Scrape-Off Layer

Ivo Furno, Paolo Ricci, Benoît Labit, Joaquim Loizu Cisquella, Federico Nespoli, Federico David Halpern, Fabio Riva

To investigate the mechanisms leading to the heat deposition onto the first wall in the Scrape-Off Layer (SOL), we perform dedicated numerical non-linear simulations of the SOL plasma dynamics of a TCV discharge using the GBS code. The simulated parallel h ...

Elsevier Science Bv2017

Coherence management in lithography printing systems

Hans Peter Herzig, Toralf Scharf, Johana Bernasconi

In proximity lithography, interference and diffraction effects arise when printing small features because of the proximity gap. Different techniques are used in order to control and take advantage of theses effects. In this paper, the focus is set on the M ...

Spie-Int Soc Optical Engineering2016

Lightfields behind amplitude masks Creating phase discontinuities

Hans Peter Herzig, Toralf Scharf, Wilfried Noell, Myun Sik Kim, Krishnaparvathy Puthankovilakam

Shaping of light fields behind amplitude and phase masks the basis the lithographic structure reproduction. The aerial image or better the intensity distribution defines the resolution of the structure to be printed. Contrast is the main parameter and to a ...

Ieee2016

Fabrication defects and grating couplers in III-nitride photonic crystal nanobeam lasers (Conference Presentation)

Nicolas Grandjean, Jean-François Carlin, Raphaël Butté, Ian Michael Rousseau

We report a numerical and experimental investigation of fabrication tolerances and outcoupling in optically pumped III-nitride nanolasers operating near lambda = 460 nm, in which feedback is provided by a one-dimensional photonic crystal nanobeam cavity an ...

Spie-Int Soc Optical Engineering2016

Sub-20nm gaps in HSQ for ultra-scaled nanoelectronic devices

Maneesha Rupakula, Wolfgang Amadeus Vitale

We build sub-20 nm gaps in hydrogen silsesquioxane (HSQ) by electron beam lithography, to enable nano-template structures for selective epitaxial growth of Ge or III-V semiconductors for ultra-scaled electronic applications [1]. Gaps of this order have bee ...

2016

Intensity and phase fields behind phase-shifting masks studied with high-resolution interference microscopy

Hans Peter Herzig, Toralf Scharf, Myun Sik Kim, Ali Naqavi, Krishnaparvathy Puthankovilakam

We try to find out the details of how light fields behind the structures of photomasks develop in order to determine the best conditions and designs for proximity printing. The parameters that we use approach real situations like structure printing at prox ...

SPIE-Intl Soc Optical Eng2016

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Lithographie extrême ultraviolet

Collisional damping rates for electron plasma waves reassessed

Silk Fibroin as a Resist for Thermal Scanning Probe Lithography

Non-linear simulations of the TCV Scrape-Off Layer

Panel: Looking Backwards and Forwards

Coherence management in lithography printing systems

Lightfields behind amplitude masks Creating phase discontinuities

Fabrication defects and grating couplers in III-nitride photonic crystal nanobeam lasers (Conference Presentation)

Large-Area Low-Cost Plasmonic Perfect Absorber Chemical Sensor Fabricated by Laser Interference Lithography

Sub-20nm gaps in HSQ for ultra-scaled nanoelectronic devices

Intensity and phase fields behind phase-shifting masks studied with high-resolution interference microscopy

Graph Chatbot

Chattez avec Graph Search

Collisional damping rates for electron plasma waves reassessed

Silk Fibroin as a Resist for Thermal Scanning Probe Lithography

Non-linear simulations of the TCV Scrape-Off Layer

Panel: Looking Backwards and Forwards

Lightfields behind amplitude masks Creating phase discontinuities

Coherence management in lithography printing systems

Fabrication defects and grating couplers in III-nitride photonic crystal nanobeam lasers (Conference Presentation)

Large-Area Low-Cost Plasmonic Perfect Absorber Chemical Sensor Fabricated by Laser Interference Lithography