Publications associées à Microfabrication

Combination of Electron or Laser Beam Irradiation with High Vacuum Chemical Vapor Deposition (HV-CVD) of Al2O3 for in-situ Local Structuring on Wafer Scale Substrate

Patrik Willi Hoffmann, Yury Kuzminykh, Xavier Multone

A laser or electron beam assisted deposition in HV-CVD conditions was used in order to achieve structured amorphous alumina (Al2O3) deposits. Selective deposition of Al2O3 in the irradiated regions has been demonstrated. We investigate the influence of irr ...

ECS - The Electrochemical Society2009

Etching of sub-micrometer structures through Stencil

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Andreea Veronica Savu, Marc Antonius Friedrich van den Boogaart, Oscar Vazquez Mena, Katrin Sidler Arnet, Kristopher Pataky

Resistless processes to realize the pattern transfer of your designs into the substrate present some advantages, as the reduction in fabrication steps. Stencil Lithography (SL) is one of the most used resistless processes and, up to now, it has mainly been ...

2008

Stencil assisted reactive ion etching for micro and nano patterning

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Stencil-assisted oxygen reactive ion etching is a low-cost and parallel process for the replication of micrometric and nanometric patterns in any organic material. This lithography process allows the patterning of organic material non sensitive to electron ...

2008

Focussed ion beam based fabrication of micro-electro-mechanical resonators

Mihai Adrian Ionescu, Daniel Grogg, Nicoleta-Diana Ciressan

Abstract: A simple and fast process to fabricate micro-electro-mechanical (MEM) resonators with deep sub-micron transduction gaps in thin SOI is presented. The proposed process is realized on both 350 nm and 1.5 μm thin silicon-on-insulator (SOI) substrate ...

Springer-Verlag2008

Fabrication of MEMS Resonators in Thin SOI

Mihai Adrian Ionescu, Daniel Grogg, Nicoleta-Diana Ciressan

A simple and fast process for micro-electromechanical (MEM) resonators with deep sub-micron transduction gaps in thin SOI is presented in this paper. Thin SOI wafers are important for advanced CMOS technology and thus are evaluated as resonator substrates ...

2008

Ion Beam Etching: Replication of Micro Nano-structured 3D Stencil Masks

Jürgen Brugger, Luis Guillermo Villanueva Torrijo

Ion beam LIGA allows the etching of 3D nano-structures by direct writing with a nano-sized beam. However, this is a relatively time consuming process. We propose here another approach for etching structures on large surfaces and faster, compared to the dir ...

2008

Configurable slit-mask unit of the Multi-Object Spectrometer for Infra-Red Exploration for the Keck telescope : Integration and Tests

Simon Nessim Henein, Philippe Schwab

A Configurable Slit Unit (CSU) has been developed for the Multi-Object Spectrometer for Infra-Red Exploration (MOSFIRE) instrument to be installed on the Keck 1 Telescope on Mauna Kea, Hawaii. MOSFIRE will provide NIR multi-object spectroscopy over a field ...

Society of Photo-Optical Instrumentation Engineers (SPIE)2008

Integration of a microfluidic flow cell on a CMOS biosensor for DNA detection

Nico de Rooij, Peter Van der Wal

This paper describes the fabrication technique for the realization a microfluidic flow cell to be integrated on a CMOS biosensor for DNA hybridization detection. The main element of the microfluidic system is made in polydimethylsiloxane (PDMS) elastomer a ...

IEEE Service Center, 445 Hoes Lane, Po Box 1331, Piscataway, Nj 08855-1331 Usa2008

Polymer microoptoelectromechanical systems: Accelerometers and variable optical attenuators

Luis Guillermo Villanueva Torrijo, Victor Javier Cadarso Busto

This paper presents the design, fabrication and characterization of polymer microoptoelectromechanical systems (MOEMS). An optical accelerometer and a variable optical attenuator (VOA) based on SU-8 are presented. Both devices consist on a quad-beam polyme ...

2008

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Microfabrication

Combination of Electron or Laser Beam Irradiation with High Vacuum Chemical Vapor Deposition (HV-CVD) of Al2O3 for in-situ Local Structuring on Wafer Scale Substrate

Etching of sub-micrometer structures through Stencil

Stencil assisted reactive ion etching for micro and nano patterning

Separation, detection and quantification of biomolecules in lab-on-a-chip systems

Focussed ion beam based fabrication of micro-electro-mechanical resonators

Fabrication of MEMS Resonators in Thin SOI

Ion Beam Etching: Replication of Micro Nano-structured 3D Stencil Masks

Configurable slit-mask unit of the Multi-Object Spectrometer for Infra-Red Exploration for the Keck telescope : Integration and Tests

Integration of a microfluidic flow cell on a CMOS biosensor for DNA detection

Polymer microoptoelectromechanical systems: Accelerometers and variable optical attenuators

Graph Chatbot

Chattez avec Graph Search

Etching of sub-micrometer structures through Stencil

Separation, detection and quantification of biomolecules in lab-on-a-chip systems

Focussed ion beam based fabrication of micro-electro-mechanical resonators

Ion Beam Etching: Replication of Micro Nano-structured 3D Stencil Masks

Combination of Electron or Laser Beam Irradiation with High Vacuum Chemical Vapor Deposition (HV-CVD) of Al2O3 for in-situ Local Structuring on Wafer Scale Substrate

Fabrication of MEMS Resonators in Thin SOI

Polymer microoptoelectromechanical systems: Accelerometers and variable optical attenuators

Stencil assisted reactive ion etching for micro and nano patterning

Configurable slit-mask unit of the Multi-Object Spectrometer for Infra-Red Exploration for the Keck telescope : Integration and Tests

Integration of a microfluidic flow cell on a CMOS biosensor for DNA detection