Publication
Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
Publications associées (30)
Edoardo Charbon, Claudio Bruschini, Ekin Kizilkan, Pouyan Keshavarzian, Francesco Gramuglia, Won Yong Ha, Myung Jae Lee
Mohammad Khaja Nazeeruddin, Olga Syzgantseva
Elison de Nazareth Matioli, Zheng Hao, Alessandro Floriduz
Chengmin Li, Rui Lu, Heng Fang
Kyojin Choo, Li Xu, Yimai Peng
Edoardo Charbon, Claudio Bruschini, Myung Jae Lee, Feng Liu