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This lecture covers various topics related to micro and nanofabrication, including MEMS, cleanroom processes, CVD, PVD, lithography, etching techniques, and dry etching of materials like silicon and aluminum. It explains the principles behind plasma etching, anisotropic etching, and the effects of different gases on the etching process. The instructor also discusses the importance of selective etching, sidewall protection, and the use of different dry etchants for specific applications.