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Physical Vapor Deposition: Basics and Applications
This lecture covers the principles and equipment of Physical Vapor Deposition (PVD) techniques, including thermal evaporation and sputtering. It explains the three stages of thin film deposition, vapor creation, and flux towards the substrate. The lecture also discusses examples of PVD processes and the factors affecting vapor flux. Various methods of heating the evaporant are explored, such as resistive heaters and electron beams. The concept of mean free path in vapor flux towards the substrate is detailed, along with practical examples. Overall, the lecture provides insights into the micro and nanofabrication processes in MEMS technology.