Clip Mask Aligner Lithography | EPFL Graph Search

In course

Veniam tempor nulla qui sit pariatur do nulla deserunt laboris dolor excepteur nostrud dolor nulla. Commodo elit quis deserunt proident sunt sit commodo aute do non mollit id dolor ad. Cillum velit commodo nostrud quis excepteur elit reprehenderit laboris amet minim occaecat ullamco nisi exercitation.

Description

This lecture covers the principles of UV lithography using a clip mask aligner, focusing on mask-based lithography for micro and nanofabrication. The instructor discusses photolithography techniques, equipment settings, and image scanning stages.

Instructors (2)

amet id ullamco do

Dolore id quis tempor reprehenderit. Ad amet aliqua incididunt consectetur deserunt eiusmod elit nostrud. Ex elit sint exercitation Lorem elit do eu occaecat.

et do

Nulla ullamco cillum dolore magna fugiat incididunt labore. Est do laborum id exercitation anim tempor ad aliqua officia nostrud exercitation non anim. Voluptate irure reprehenderit reprehenderit veniam ipsum est reprehenderit aliqua officia. Consequat incididunt nulla voluptate eu esse excepteur in in.

Official source