Electron Beam Lithography: Tool Overview

This lecture covers the principles and applications of Electron Beam Lithography (EBL), focusing on the tool overview, vacuum levels, electron sources, and electron guns. It explains how EBL overcomes the optical diffraction limit, enabling the fabrication of sub-20 nm features. The instructor discusses the key components of an EBL system, such as the electron gun, optics, pattern generator, and interferometric stage. Different types of electron sources, including thermionic and field emitters, are explored in detail, highlighting their characteristics and applications in nanofabrication.