Sputtering: Film Growth and Control Parameters

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Sputtering in CMi

Covers the operation of a cluster sputtering tool and the process of changing sputter targets.

Gas Transport and Film Growth Rate

Covers mass transport in the boundary layer, gas transfer to the substrate, film growth rate calculation, and experimental results.

Thin-Film Processing: Removal and Deposition

Explores thin-film removal and deposition techniques in CMOS technology, covering wet etching, dry etching, chemical mechanical polishing, and thin-film deposition methods.

Micro/Nanomechanical Devices: Fabrication Techniques

Explores the fabrication of micro/nanomechanical devices, covering release, selectivity, stiction, deposition, etching, lithography, and growth techniques.

Organic Thin Film Growth

Explores organic thin film growth methods, nucleation, grain growth, crystal alignment, and solvent vapor annealing.

Chemical Vapour Deposition: Micro and Nanofabrication

Explores Chemical Vapour Deposition for micro and nanofabrication processes.

Plasma Focused Ion Beam: Applications and Techniques

Explores Plasma Focused Ion Beam technology, covering high-precision imaging, material deposition, and automated system checks.

Focused Ion Beam: Principles and Applications

Explores the principles and applications of Focused Ion Beam (FIB) technology, including imaging, milling, and 3D microscopy.

Thin Films and Tandem Solar Cells

Covers thin film solar cells, their advantages, market status, and challenges, including CdTe, CIGS, and perovskite cells, and explores the potential of multijunction cells.

Transparent Conductive Oxide: Sputtering

Explores sputtering principles for transparent conductive oxide in solar cells and the use of piezoelectric materials for sensors and filters.