Lecture

Sputtering in CMi

In course

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Description

This lecture explains the operation of a cluster sputtering tool with four deposition chambers, allowing the transfer of wafers without breaking the vacuum. It details the process of changing sputter targets and the differences between RF magnetron and DC magnetron sputtering.

In MOOCs (3)

Instructors (2)

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Official source

https://mediaspace.epfl.ch/media/0_8tr9l98l

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Ontological neighbourhood

Chemical engineering

Materials science: Thin film

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