Chemical Vapour Deposition Basics

This lecture covers the fundamentals of Chemical Vapour Deposition (CVD), a process involving chemical reactions for depositing materials like tungsten at high temperatures. It explains the use of gaseous phase for conformal deposition, showcases a thermal CVD reactor, and details the CVD process including gas flow, thermodynamics, and film growth kinetics. The importance of controlling gas flow, pressure, and temperature for uniform film growth is emphasized, along with the classification of CVD based on pressure and reactor types.