Sputtering: Plasma Formation and Thin Film Deposition
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Covers the fundamentals and techniques of Chemical Vapor Deposition (CVD), including mass transfer, film growth rate calculation, and various CVD techniques.
Explores various Chemical Vapor Deposition processes, including APCVD, SACVD, LPCVD, UHV/CVD, PECVD, and MOCVD, focusing on film growth and plasma effects.
