Industrial Plasmas: Sheath Formation and Plasma Etching

This lecture covers the formation of industrial plasmas, focusing on sheath development and plasma etching processes. Topics include the transition from Townsend discharge to plasma glow, Maxwell-Boltzmann distribution, ion flux, sheath potential, and density profiles. The instructor explains the importance of using AC for continuous plasma processing, the basics of radio-frequency plasma, and large area RF capacitively-coupled reactors. Furthermore, the lecture delves into Plasma-Enhanced Chemical Vapour Deposition (PECVD) of thin film silicon, Dielectric Barrier Discharge (DBD) for ozone production, and the ozone production process by plasma chemistry. The session concludes with a summary of plasma with insulating electrodes, emphasizing RF capacitively-coupled plasma and Dielectric Barrier Discharge for ozone generation.