Lecture
This lecture covers the formation of industrial plasmas, focusing on sheath development and plasma etching processes. Topics include the transition from Townsend discharge to plasma glow, Maxwell-Boltzmann distribution, ion flux, sheath potential, and density profiles. The instructor explains the importance of using AC for continuous plasma processing, the basics of radio-frequency plasma, and large area RF capacitively-coupled reactors. Furthermore, the lecture delves into Plasma-Enhanced Chemical Vapour Deposition (PECVD) of thin film silicon, Dielectric Barrier Discharge (DBD) for ozone production, and the ozone production process by plasma chemistry. The session concludes with a summary of plasma with insulating electrodes, emphasizing RF capacitively-coupled plasma and Dielectric Barrier Discharge for ozone generation.