Sputtering: Plasma Formation and Thin Film Deposition

In course

Description

This lecture introduces sputtering as a physical vapor deposition technique, explaining how a plasma is created, the different plasma zones in the sputter chamber, and the process optimization. It details the ion bombardment mechanism to remove material from a target and deposit it on a substrate, showcasing the steps involved in creating a plasma and depositing thin films of various materials. The lecture also covers the principles of plasma, its role in sputtering, and the transition from a dark discharge to a glow discharge, essential for microfabrication applications.

In MOOCs (3)

Instructors (2)

Official source

https://mediaspace.epfl.ch/media/0_i83viqcx

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Related concepts (44)

Physical vapor deposition

Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.

Glow discharge

A glow discharge is a plasma formed by the passage of electric current through a gas. It is often created by applying a voltage between two electrodes in a glass tube containing a low-pressure gas. When the voltage exceeds a value called the striking voltage, the gas ionization becomes self-sustaining, and the tube glows with a colored light. The color depends on the gas used. Glow discharges are used as a source of light in devices such as neon lights, cold cathode fluorescent lamps and plasma-screen televisions.

Thin film

A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. The controlled synthesis of materials as thin films (a process referred to as deposition) is a fundamental step in many applications. A familiar example is the household mirror, which typically has a thin metal coating on the back of a sheet of glass to form a reflective interface. The process of silvering was once commonly used to produce mirrors, while more recently the metal layer is deposited using techniques such as sputtering.

Chemical vapor deposition

Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

Electric discharge

In electromagnetism, an electric discharge is the release and transmission of electricity in an applied electric field through a medium such as a gas (ie., an outgoing flow of electric current through a non-metal medium). The properties and effects of electric discharges are useful over a wide range of magnitudes. Tiny pulses of current are used to detect ionizing radiation in a Geiger–Müller tube. A low steady current can be used to illustrate the spectrum of gases in a gas-filled tube.