PVD 3: Sputtering and Paschen's Law

Related lectures (24)

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Covers sputtering, plasma creation, and thin film deposition processes.

Explores breakdown in low-pressure gases, plasma physics applications, and the self-sustaining discharge phenomenon.

Explores industrial plasma applications, challenges, and key principles governing plasma behavior in various industries.

Explores plasma formation, sheath creation, and plasma etching applications for integrated circuit manufacturing.

Explores industrial plasma applications, breakdown phenomena, and plasma chemistry challenges, including gas-phase reactions and transport processes.

Explores breakdown phenomena in low-pressure gases, including Townsend's criterion, Paschen's law, and numerical simulations.

Explores sheath formation, plasma etching, AC plasma processing, and ozone production.

Introduces hydrology fundamentals, covering soil moisture, rainfall modeling, and reservoir systems.

Introduces ion beam etchers, combining physical sputtering with chemical activity.

Explores thin-film processing techniques, including CVD, ALD, and plasma interactions, emphasizing their advantages and applications.