Publications related to Electron Bernstein Wave Core Deposition via O-X-B Double Mode Conversion in TCV

X-ray-induced Cu deposition and patterning on insulators at room temperature

X-ray irradiation is shown to trigger the deposition of Cu from solution, at room temperature, on a wide variety of insulating substrates: glass, passivated Si, TiN/Ti/SiO2/Si and photoresists like PMMA and SU-8. The process is suitable for patterning and ...

International Union of Crystallography2015

Combinatorial HV-CVD survey of barium triisopropyl cyclopentadienyl and titanium tetraisopropoxide for the deposition of BaTiO3

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

Barium titanate is a very promising material for the integration of optical communication into electronic integrated circuits. For a successful integration into CMOS compatible technology, a growth process has to be found which allows forming crystalline B ...

Wiley-VCH Verlag Berlin2015

Solid on liquid deposition, a review of technological solutions

Roland Andreas Bitterli, Laure Jeandupeux

Solid-on-liquid deposition (SOLID) techniques are of great interest to the MEMS and NEMS (Micro- and Nano Electro Mechanical Systems) community because of potential applications in biomedical engineering, on-chip liquid trapping, tunable micro-lenses, and ...

Elsevier2015

High-mobility organic thin-film transistors based on a small-molecule semiconductor deposited in vacuum and by solution shearing

Klaus Kern, Hagen Klauk

The small-molecule organic semiconductor 2,9-di-decyl-dinaphtho-[2,3-b: 2',3'-f]-thieno[3,2-b]-thiophene (C-10-DNTT) was used to fabricate bottom-gate, top-contact thin-film transistors (TFTs) in which the semiconductor layer was prepared either by vacuum ...

Elsevier Science Bv2013

Precursor adsorption efficiency of titanium tetra isopropoxide in the presence of a barium beta-diketonate precursor

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

Barium titanate is a promising candidate for integrated photonic application due to its high electro-optic coefficient; therefore the need arises for a suitable deposition technique which provides high film quality at low temperatures (below 500 degrees C) ...

Elsevier Science Sa2013

High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection

Patrik Willi Hoffmann, Ali Dabirian, Yury Kuzminykh, Michael Oliver Reinke

Thin films of oxide materials are widely used for various types of applications. The selection of an appropriate deposition method depends on the aimed material and application. We review here a high vacuum chemical vapour deposition (HV-CVD) method, which ...

Elsevier2013

Plasma deposition in an ideal showerhead reactor: a two-dimensional analytical solution

Christoph Hollenstein, Alan Howling, Boris Legradic, Michaël Chesaux

The interplay of gas flow and depletion by plasma dissociation determines the spatial distribution of species and the deposition uniformity in a plasma source. Many plasma reactors use a gas showerhead and the design of the flow dynamics is a critical aspe ...

2012

Efficient optimization of high vacuum chemical vapor deposition of niobium oxide on full wafer scale

Paul Muralt, Patrik Willi Hoffmann, Ali Dabirian, Yury Kuzminykh, Estelle Wagner, Scott Harada, Giacomo Benvenuti

A systematic study of niobium oxide deposition using niobium tetraethoxy-dimethyl-amino-ethoxide (Nb(OEt)(4)(dmae)) precursor is presented. The deposition process was conducted in a high-vacuum chemical vapor deposition machine with precursor flux gradient ...

Iop Publishing Ltd, Dirac House, Temple Back, Bristol Bs1 6Be, England2010

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Electron Bernstein Wave Core Deposition via O-X-B Double Mode Conversion in TCV

X-ray-induced Cu deposition and patterning on insulators at room temperature

X-ray-induced Cu deposition and patterning on insulators at room temperature

Combinatorial HV-CVD survey of barium triisopropyl cyclopentadienyl and titanium tetraisopropoxide for the deposition of BaTiO3

Solid on liquid deposition, a review of technological solutions

High-mobility organic thin-film transistors based on a small-molecule semiconductor deposited in vacuum and by solution shearing

Electrospray Ion Beam Deposition of Complex Non-Volatile Molecules

Precursor adsorption efficiency of titanium tetra isopropoxide in the presence of a barium beta-diketonate precursor

High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection

Plasma deposition in an ideal showerhead reactor: a two-dimensional analytical solution

Efficient optimization of high vacuum chemical vapor deposition of niobium oxide on full wafer scale

Graph Chatbot

Chat with Graph Search

Combinatorial HV-CVD survey of barium triisopropyl cyclopentadienyl and titanium tetraisopropoxide for the deposition of BaTiO3

Solid on liquid deposition, a review of technological solutions

High-mobility organic thin-film transistors based on a small-molecule semiconductor deposited in vacuum and by solution shearing

Electrospray Ion Beam Deposition of Complex Non-Volatile Molecules

Efficient optimization of high vacuum chemical vapor deposition of niobium oxide on full wafer scale

Precursor adsorption efficiency of titanium tetra isopropoxide in the presence of a barium beta-diketonate precursor

High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection

Plasma deposition in an ideal showerhead reactor: a two-dimensional analytical solution

X-ray-induced Cu deposition and patterning on insulators at room temperature

X-ray-induced Cu deposition and patterning on insulators at room temperature