Publications associées à Lithographie extrême ultraviolet

Addressable MEMS slit mask for multi-object spectroscopy based on multi-wafer stacking

Nico de Rooij, Michael David Canonica, Wilfried Noell

MEMS-based programmable slit masks are developed for multi-object spectroscopy in astronomy. Devices with 2048 tiltable micromirrors were fabricated using multiple wafer-level bonding and implemented with individual addressing of each element. ...

Ieee Service Center, 445 Hoes Lane, Po Box 1331, Piscataway, Nj 08855-1331 Usa2011

Pneumatically tunable optofluidic 2 x 2 switch for reconfigurable optical circuit

Demetri Psaltis, Wuzhou Song

We presented a pneumatically tunable 2 x 2 optofluidic switch for on-chip light routing that was controlled by compressed air. The device was fabricated with an optically clear elastomer-polydimethylsiloxane ( PDMS)-by soft-lithography. The optical switchi ...

Royal Society of Chemistry2011

Effect of debris on the silicon wafering for solar cells

Christophe Ballif, Adrien Bidiville

The wafers used by the photovoltaic industry are mostly produced by multi-wire slurry sawing. One of the key factors determining the wafer quality (presence of saw marks and chips, increased roughness, wafer thickness variations and wafer strength) is the ...

Elsevier2011

Angular Dependence of Magnetic Normal Modes in NiFe Antidot Lattices With Different Lattice Symmetry

Dirk Grundler

We report an experimental investigation of the magnetic normal modes in large-area Ni80Fe20 antidot arrays fabricated on commercially available silicon substrates using deep ultraviolet lithography at 248 nm exposing wavelength. The effect of the lattice s ...

Institute of Electrical and Electronics Engineers2010

Electron-beam induced photoresist shrinkage influence on 2D profiles

Vasiliki Tileli

For many years, lithographic resolution has been the main obstacle in keeping the pace of transistor densification to meet Moore's Law. For the 32 nm node and beyond, new lithography techniques will be used, including immersion ArF (iArF) lithography and e ...

International Society for Optics and Photonics2010

Development of MEMS-based programmable slit mask for Multi-Object Spectroscopy

Nico de Rooij, Michael David Canonica, Wilfried Noell

We are developing MEMS-based programmable reflective slit masks for future generation infrared multi-object spectroscopy (MOS) for space and ground-based telescopes. These devices are composed of monocrystalline silicon micromirrors of size 200 x 100 um(2) ...

Spie-Int Soc Optical Engineering, Po Box 10, Bellingham, Wa 98227-0010 Usa2010

MAGNETIC NANOCRYSTAL MODIFIED EPOXY PHOTORESIST FOR MICROFABRICATION OF AFM PROBES

Jürgen Brugger, Cristina Martin Olmos

Nanocomposites based on an organic polymer and inorganic nanocrystals (NCs) represent a class of high impact functional materials able to convey the unique size and shape dependent properties of nano-objects to highly processable resists.[1] In this work, ...

2010

Fabrication of slot waveguide cavity for sensing application

Hans Peter Herzig, Qing Tan, Armando Cosentino

The fabrication of a slot waveguide cavity oriented to sensing application is demonstrated. The choice of materials and the development of the process flow steps, including E-beam lithography (EBL) and metal lift-off of a single thin layer, are illustrated ...

2010

Fabrication of Heterogeneous Nanogaps for Characterizing Electrochemical Metal Deposition Processes

Nico de Rooij, Sebastian Gautsch, Yexian Wu

We present a much simpler and high-throughput method compared to mechanically break junctions (MBJ) and electro-migration, to produce a heterogeneous nanogap, directly using electron beam lithography and metal lift-off technology. Au – Pt and Au – Pt silic ...

2010

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Lithographie extrême ultraviolet

Addressable MEMS slit mask for multi-object spectroscopy based on multi-wafer stacking

Pneumatically tunable optofluidic 2 x 2 switch for reconfigurable optical circuit

Effect of debris on the silicon wafering for solar cells

Angular Dependence of Magnetic Normal Modes in NiFe Antidot Lattices With Different Lattice Symmetry

Electron-beam induced photoresist shrinkage influence on 2D profiles

Development of MEMS-based programmable slit mask for Multi-Object Spectroscopy

MAGNETIC NANOCRYSTAL MODIFIED EPOXY PHOTORESIST FOR MICROFABRICATION OF AFM PROBES

Fabrication of slot waveguide cavity for sensing application

Fabrication of Heterogeneous Nanogaps for Characterizing Electrochemical Metal Deposition Processes

Biomolecule Patterning on Analytical Devices: A Microfabrication-Compatible Approach

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Chattez avec Graph Search

Addressable MEMS slit mask for multi-object spectroscopy based on multi-wafer stacking

Pneumatically tunable optofluidic 2 x 2 switch for reconfigurable optical circuit

Electron-beam induced photoresist shrinkage influence on 2D profiles

Effect of debris on the silicon wafering for solar cells

MAGNETIC NANOCRYSTAL MODIFIED EPOXY PHOTORESIST FOR MICROFABRICATION OF AFM PROBES

Development of MEMS-based programmable slit mask for Multi-Object Spectroscopy

Fabrication of Heterogeneous Nanogaps for Characterizing Electrochemical Metal Deposition Processes

Angular Dependence of Magnetic Normal Modes in NiFe Antidot Lattices With Different Lattice Symmetry

Biomolecule Patterning on Analytical Devices: A Microfabrication-Compatible Approach

Fabrication of slot waveguide cavity for sensing application