Publications associées à Eau-forte

Demonstrating and Unraveling a Controlled Nanometer-Scale Expansion of the Vacancy Defects in Graphene by CO2

Kumar Varoon Agrawal, Kuang-Jung Hsu, Luis Francisco Villalobos Vazquez de la Parra

A controlled manipulation of graphene edges and vacancies is desired for molecular separation, sensing and electronics applications. Unfortunately, available etching methods always lead to vacancy nucleation making it challenging to control etching. Herein ...

Wiley-VCH Verlag GmbH2022

Study on the Performances of AlScN based SAW/BAW Hybrid Resonators A Parametric Analysis of Acoustic Wave Resonators with Large Figure of Merit

Luis Guillermo Villanueva Torrijo, Soumya Yandrapalli, Guilain Lionel Germain Lang

In this study, we analyze a 3rd type of FBAR's fundamental mode by finite element method. We show the importance of the substrate's wave velocity and conductivity on the electromechanical coupling efficiency. Then we demonstrate that etching traditional SA ...

IEEE2021

Microfluidics by Additive Manufacturing for Wearable Biosensors: A Review

Christian Enz, Sandro Carrara, Mahshid Alsadat Padash

Wearable devices are nowadays at the edge-front in both academic research as well as in industry, and several wearable devices have been already introduced in the market. One of the most recent advancements in wearable technologies for biosensing is in the ...

2020

Ultrahigh flux gas-selective nanoporous carbon membrane and manufacturing method thereof

Kumar Varoon Agrawal, Nikunj Dudani, Mostapha Dakhchoune, Shiqi Huang, Guangwei He

The present relates to a nanoporous carbon membrane manufacturing method comprising coating a block copolymer film with hydrophilic and hydrophobic blocks, on a sacrificial non-porous substrate so as to prepare an block copolymer film coated foil, transfer ...

2018

High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching

Jürgen Brugger, Yuliya Lisunova

Thermal scanning probe lithography is an emerging nanofabrication technique for rapid prototyping of arbitrary topographies in thermally sensitive resist. This feature, paired to the recent advances in dry plasma etching techniques, allows the fabrication ...

Elsevier2017

Graphene : from Growth to Devices

Laurent Syavoch Bernard

We report a full study of graphene synthesis by CVD on Cu surface. Two CVD methods have been developed. The first is a static one, which yields monolayer of graphene at low pressure of methane in 3 minutes at 1000 C. The second one is an equimolar method w ...

EPFL2015

Water adsorption on etched hydrophobic surfaces of L-, D- and DL-valine crystals

Juan José Segura Sugranes

The adsorption of water on etched (001) surfaces of L-, D- and DL-valine crystals has been characterized by atomic force microscopy (AFM) using different operational modes (contact, non-contact and electrostatic) above and below the dew point, the temperat ...

Elsevier2014

Top-Down Fabrication of Silicon Nanowires in Ultra-deep Trenches

Georg Fantner, Davide Sacchetto, Yusuf Leblebici, Oliver Peric, Zuhal Tasdemir

One-Dimensional (1D) nanostructures have gained a considerable attention in the field of semiconductor technology for the past several decades. With the help of rapid development in the process technology, it becomes possible to scale these nanostructures ...

2014

High Piezoelectric Longitudinal Coefficients in Sol-gel PZT Thin Film Multilayers

Paul Muralt, Andrea Mazzalai, Antonia Neels, Silviu Cosmin Sandu, Nachiappan Chidambaram, Alex Dommann, Davide Balma

A five-layer stack of lead zirconate titanate (PZT) thin films with Pt electrodes was fabricated for potential applications in nanoactuator systems. The 1 mu m thick PZT films were deposited by a sol-gel technique, the platinum electrodes by sputtering. Th ...

Wiley-Blackwell2014

Application of stencil masks for ion beam lithographic patterning

Jürgen Brugger, Andreea Veronica Savu

The application of Au/Si3N4 stencil masks for the transfer of patterns using different MeV-ion beams with various substrates has been investigated. The techniques investigated were namely, conventional lithography with positive- and negative-tone resist po ...

Elsevier2013