Conception optique

Résumé

La conception optique est un domaine de l'ingénierie optique dont le but est de créer, optimiser et produire des systèmes optiques comme des objectifs, des viseurs, des télescopes, des microscopes, etc. La conception optique repose essentiellement sur les lois de l'optique géométrique et sur la radiométrie. Historique La conception optique recouvrant tout le processus d'élaboration d'un système optique, c'est un champ de l'optique qui est né dès la création des premiers systèmes optiques. Jusqu'à très tard au cependant, ce sont moins des calculs que des approches expérimentales qui sont utilisées, ainsi l'objectif à ménisque de Wollaston a été conçu par une approche entièrement empirique. Avec l'émergence de la théorie des aberrations développée par Philipp Ludwig von Seidel la conception s'est orientée progressivement vers le calcul tout en conservant une grande part d'expérimentation. Jusqu'au milieu du , la conception optique demeure encore un savant mélange de théori

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https://fr.wikipedia.org/wiki/Conception_optique

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Publications associées (30)

Design rules for customizable optical materials based on nanocomposites

Toralf Scharf, Friedrich Daniel Werdehausen

Nanocomposites with tailored optical properties can provide a new degree of freedom for optical design. However, despite their potential these materials remain unused in bulk optical applications. Here we investigate the conditions under which they can be used for such applications using Mie theory, effective medium theories, and numerical simulations based on the finite element method. We show that due to scattering different effective medium regimes have to be distinguished, and that bulk materials can only be realized in a specific parameter range. Our analysis also enables us to quantify the range of validity of different effective medium theories, and identify design rules on how the material's free parameters should be adjusted for specific applications. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

OPTICAL SOC AMER2018

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Gigahertz free-space electro-optic modulators based on Mie resonances

Ileana-Cristina Benea-Chelmus

Electro-optic modulators are essential for sensing, metrology and telecommunications. Most target fiber applications. Instead, metasurface-based architectures that modulate free-space light at gigahertz (GHz) speeds can boost flat optics technology by microwave electronics for active optics, diffractive computing or optoelectronic control. Current realizations are bulky or have low modulation efficiencies. Here, we demonstrate a hybrid silicon-organic metasurface platform that leverages Mie resonances for efficient electro-optic modulation at GHz speeds. We exploit quasi bound states in the continuum (BIC) that provide narrow linewidth (Q = 550 at lambda(res) = 1594 nm), light confinement to the non-linear material, tunability by design and voltage and GHz-speed electrodes. Key to the achieved modulation of Delta T/T-max = 67% are molecules with r(33) = 100 pm/V and optical field optimization for low-loss. We demonstrate DC tuning of the resonant frequency of quasi-BIC by Delta lambda(res) = 11 nm, surpassing its linewidth, and modulation up to 5 GHz (f(EO,- 3dB) = 3 GHz). Guided mode resonances tune by Delta lambda(res) = 20 nm. Our hybrid platform may incorporate free-space nanostructures of any geometry or material, by application of the active layer post-fabrication.

NATURE PORTFOLIO2022

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The information age we live in today relies on highly integrated devices. They are fabricated with the help of photolithography, the patterning technique at the heart of their production. With the continuous demand for higher integration density to achieve ever growing performance levels, not only the front-end-of-line lithography, responsible for realizing the smallest structures, is under constant pressure for improvements. At the back-end-of-line, where ICs are interfaced, and elements like display panels are structured, this drive can be felt as well. The development here goes towards the processing of substrates of increasing size surpassing the wafer-level to increase throughput, thus becoming large-field photolithography. The current resolution requirements here are typically in the 1 &mto 2 &mfor minimumfeature size. An investigation in phase-space identifies two possibilities for advanced photolithographic systems relying on different exposure mechanics. We combine a novel semiconductor laser light source emitting in the deep ultra-violet at 193 nmwith a beam-shaping system to enable proximity printing with sub-2 &mresolution with a proximity gap of 20 &m. The integration of this approach with optical exposure gapmetrology and a high-precision substrate positioning stage demonstrates the possibility for large-field exposure. In a second approach we realize a highly integrated micro-optical multi-aperture projection lens to pattern an exposure field of 100mmby 100mm. A mechanical scanner to mount the projection lens, required to achieve uniform exposure of the entire field, is realized as well. Projection lens and scanner are integrated with a high-precision substrate positioning stage and a mask aligner illumination system to demonstrate the ability for large-field photolithographic printing. The optical design is validated by demonstrating printedminimumfeature sizes of 2 &m. Practical shortcomings of the system are investigated and strategies to overcome these issues are presented and discussed.

EPFL2019

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EPFL2019